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Special Issue on Aerosol-Assisted Chemical Vapor Deposition

✍ Scribed by Kwang-Leong Choy

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
76 KB
Volume
12
Category
Article
ISSN
0948-1907

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✦ Synopsis

Abstract

As a variant of conventional CVD, AACVD involves atomization of a liquid precursor into fine aerosol droplets that are delivered to a heated zone where evaporation, decomposition, and subsequent CVD reactions occur. In this editorial, Guest Editor Kwang‐Leong Choy provides a brief overview of the articles in this Special Issue and some of the recent advances in this dynamic field.

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## Abstract The simulation of a flame assisted chemical vapor deposition (FACVD) process is here proposed with reference to the growth of silicon thin films through the silane/chlorosilanes/hydrogen/chlorine route. The goal is to design a reactor able to deposit micromorphous or multicrystalline fi