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Source characterization for x-ray proximity lithography

โœ Scribed by Vassiliev, A.; Gabel, K.; Richardson, M.; Kado, M.

Book ID
115420711
Publisher
Optical Society of America
Year
1994
Tongue
English
Weight
478 KB
Volume
19
Category
Article
ISSN
0146-9592

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## Division of Atomic Physics tDivision of Solid State Physics We describe a compact and practically debris-free laser-plasma x-ray source suitable for proximity lithography. The source is based on a microscopic fluorocarbon continuous liquid jet droplet target, generating highbrightness ~=1.2-1.7