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Si–SiO2 interface formation in low-dose low-energy separation by implanted oxygen materials

✍ Scribed by Tula Jutarosaga; Srinivas Manne; Supapan Seraphin


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
571 KB
Volume
250
Category
Article
ISSN
0169-4332

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