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SiO2film deposition in a low-pressure RF inductive discharge SiH4+ O2plasma

✍ Scribed by O. V. Morozov; I. I. Amirov

Book ID
110679253
Publisher
Springer
Year
2000
Tongue
English
Weight
505 KB
Volume
29
Category
Article
ISSN
1063-7397

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investieations on solar thermal collectors and solar systems within the precedyng IEA Task X (1985)(1986)(1987)(1988)(1989)(1990)(1991) as well as further studies in this field by the group itself formed a basis for this work. The procedure was formulated as g standard, and submitted to IS0 at the b