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RF discharge modelling in a N2O/SiH4 mixture for SiO2 deposition and comparison with experiment

โœ Scribed by Radouane, K; Date, L; Yousfi, M; Despax, B; Caquineau, H


Book ID
115540798
Publisher
Institute of Physics
Year
2000
Tongue
English
Weight
355 KB
Volume
33
Category
Article
ISSN
0022-3727

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