SiO2 etching characteristics in DC magnetron plasmas by using an external magnetic field

✍ Scribed by H Yamada; K Kuwahara; H Fujiyama

• Book ID: 108389362
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 524 KB
• Volume: 316
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/s0040-6090(98)00379-4