✦ LIBER ✦
Plasma characteristics and etch uniformity in CF4 magnetron etching using an annular permanent magnet: Haruhisa Kinoshita et al, J appl Phys, 62, 1987, 4269–4272
- Book ID
- 103468547
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 148 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0042-207X
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