✦ LIBER ✦
High rate sapphire (Al2O3) etching in inductively coupled plasmas using axial external magnetic field
✍ Scribed by D.W. Kim; C.H. Jeong; K.N. Kim; H.Y. Lee; H.S. Kim; Y.J. Sung; G.Y. Yeom
- Book ID
- 108388643
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 302 KB
- Volume
- 435
- Category
- Article
- ISSN
- 0040-6090
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