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SiO2 deposition as a byproduct of SF6 plasma in an electron cyclotron resonance reactor

โœ Scribed by A.J. Watts; W.J. Varhue; M.L. Gibson


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
397 KB
Volume
220
Category
Article
ISSN
0040-6090

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The deposition of hydrogenated amorphous carbon (a-C:H) films from a mixture of hydrogen and methane using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) method is reported. A screen grid positioned above the substrate was used to provide an electric field to accelerate the io