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Simulation on chemical mechanical polishing using atomic force microscope

โœ Scribed by Atsushi Miyoshi; Hiroyuki Nakagawa; Koei Matsukawa


Book ID
106184880
Publisher
Springer-Verlag
Year
2005
Tongue
English
Weight
375 KB
Volume
11
Category
Article
ISSN
0946-7076

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Sub-100 nm V-grooves in GaAs(001) surfaces have been fabricated by patterning a thin photoresist layer with an atomic force microscope (AFM) and subsequent wet-chemical etching. The nanolithography is based on the dynamic ploughing technique. Anisotropic etchants under investigation are bromine-meth