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Chemical Approach to High-Resolution Patterning on Self-Assembled Monolayers Using Atomic Force Microscope Lithography

✍ Scribed by Lee, Wonbae; Kim, Eung Ryul; Lee, Haiwon


Book ID
127341768
Publisher
American Chemical Society
Year
2002
Tongue
English
Weight
155 KB
Volume
18
Category
Article
ISSN
0743-7463

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