✦ LIBER ✦

Simulation of an optimized electron-beam lithographic process

✍ Scribed by Tung Symon Chang; Codella, C.F.; Lange, R.C.

Book ID: 114593970
Publisher: IEEE
Year: 1981
Tongue: English
Weight: 777 KB
Volume: 28
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1981.20626

No coin nor oath required. For personal study only.

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