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SIMS depth profiling of CrNi multilayer targets

✍ Scribed by J Giber; D Marton; J László; A Hanusovszky; P Stingeder


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
251 KB
Volume
33
Category
Article
ISSN
0042-207X

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SIMS depth profiling of TiOxNy films
✍ Metson, J. B.; Prince, K. E. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 112 KB 👁 1 views

Amorphous TiO x N y films of varying stoichiometry have been deposited on Si and Cu substrates using ionassisted deposition (IAD). The structure of the films and the effects of annealing in the 200-450 °C range have been examined. Secondary ion mass spectrometry (SIMS) has been used to investigate