Silicon/SiO2 interface formation by remote plasma-enhanced oxidation/deposition process in a cluster tool

✍ Scribed by C.G. Parker; C.L. Silvestre; J.R. Hauser

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 264 KB
• Volume: 28
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(95)00032-4