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Silicon oxynitride thin films synthesised by the reactive gas pulsing process using rectangular pulses

✍ Scribed by E. Aubry; S. Weber; A. Billard; N. Martin


Book ID
116244517
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
993 KB
Volume
257
Category
Article
ISSN
0169-4332

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Reactive gas pulsing process: A method t
✍ C. Petitjean; M. GrafoutΓ©; C. Rousselot; J.F. Pierson πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 503 KB

Fe-O-N films were deposited on glass and silicon substrates using two reactive magnetron sputtering processes. In the first process called conventional process (CP), the oxygen flow rate was kept constant during the deposition duration. On the other hand, the oxygen flow rate was pulsed in the secon