𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Silicon Oxide Surface as a Substrate of Polymer Thin Films

✍ Scribed by Shin, K.; Hu, X.; Zheng, X.; Rafailovich, M. H.; Sokolov, J.; Zaitsev, V.; Schwarz, S. A.


Book ID
127174984
Publisher
American Chemical Society
Year
2001
Tongue
English
Weight
96 KB
Volume
34
Category
Article
ISSN
0024-9297

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Surface characterization of thin silicon
✍ D. RistiΔ‡; V. HolΓ½; M. Ivanda; M. MarciuΕ‘; M. Buljan; O. Gamulin; K. FuriΔ‡; M. R πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier Science 🌐 English βš– 685 KB

The silicon-rich oxide (SiO x ) films were deposited using the LPCVD (Low Pressure Chemical Vapour Deposition) method at the temperature of 570 Β°C and with silane and oxygen as the reactant gasses. The films were deposited on silicon (1 1 1) substrates. The flows of oxygen and silan in the horizonta

Growth and characterization of zirconium
✍ P.Y. Kuei; J.D. Chou; C.T. Huang; H.H. Ko; S.C. Su πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier Science 🌐 English βš– 843 KB

The growth and characterization of zirconium oxide (ZrO 2 ) thin films prepared by thermal oxidation of a deposited Zr metal layer on SiO 2 /Si were investigated. Uniform ZrO 2 thin film with smooth surface morphology was obtained. The thermal ZrO 2 films showed a polycrystalline structure. The diel