Silicon-on-insulator non-volatile field-effect transistor memory
β Scribed by J.R. Schwank; M.R. Shaneyfelt; T.L. Meisenheimer; B.L. Draper; K. Vanhesden; D.M. Fleetwood
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 104 KB
- Volume
- 59
- Category
- Article
- ISSN
- 0167-9317
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β¦ Synopsis
Submicron nonvolatile memory transistors were fabricated by exposing silicon-on-insulator (SOI) buried oxides to hydrogen at elevated temperatures to generate mobile protons in the buried oxides. By switching the polarity of the bias to the SOI substrate, the mobile protons in the buried oxide were transported to either the top or bottom Si-buried oxide interface, switching the leakage current of top gate transistors from an ON to an OFF state.
π SIMILAR VOLUMES
Over the past decade, organic electronics have been investigated due to their various merits, such as low cost, flexibility, easy fabrication, and printing capability. [1][2][3][4][5] Many researchers have reported high-performance organic light-emitting diodes (OLEDs), organic thin-film transistors