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Silicon nitride chemical vapor deposition from dichlorosilane and ammonia: theoretical study of surface structures and reaction mechanism

✍ Scribed by Alexander A. Bagatur'yants; Konstantin P. Novoselov; Andrei A. Safonov; J. Vernon Cole; Matthew Stoker; Anatoli A. Korkin

Book ID
117215809
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
234 KB
Volume
486
Category
Article
ISSN
0039-6028

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Thermodynamics and kinetics of initial g
Thermodynamics and kinetics of initial gas phase reactions in chemical vapor deposition of titanium nitride. Theoretical study of TiCl4 ammonolysis
✍ Stanislav Ya. Umanskii; Konstantin P. Novoselov; Airat Kh. Minushev; Magdalena S πŸ“‚ Article πŸ“… 2001 πŸ› John Wiley and Sons 🌐 English βš– 204 KB

## Abstract Thermodynamic equilibrium and kinetics of the gas‐phase reaction between TiCl~4~ and NH~3~ have been studied computationally using results from recent quantum mechanical calculations of titanium tetrachloride ammonolysis.1 These calculations were based upon the transition state theory f