Silicon carbide control in the EFG system
β Scribed by Rajendran, S.; Larrousse, M.; Bathey, B.R.; Kalejs, J.P.
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 372 KB
- Volume
- 128
- Category
- Article
- ISSN
- 0022-0248
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
The transition behaviour of the phosphorus incorporation in silicon epitaxial layers grown in a CVD reactor has been investigated, considering the reactor as a linear control system with u = lg pOpR, ( t ) as the input and y = lg N ( t ) as the output. The response of system to both upward and downw
Under conditions of medium decomposition of MTS (10-90 X), a transition between region A (growth of nearly stoichiometric Sic) and region B (Siexcess Sic deposition) may be indueed by the variations of total flow rate, total pressure or temperature in relatively small intervals. After the modificati