Content: Front Cover; Silicon-Based Materials and Devices: Materials and Processing; Copyright Page; Contents; Preface; About the Editor; List of Contributors; CHAPTER 1. OPTICAL, STRUCTURAL, AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON CARBIDE FILMS; CHAPTER 2. SILICON CARBON NITRIDE: A NEW WIDEBAND GAP MATERIAL; CHAPTER 3. AMORPHOUS SILICA; CHAPTER 4. GAS PHASE AND SURFACE KINETICS OF SILICON CHEMICAL VAPOR DEPOSITION FROM SILANE AND CHLOROSILANES; CHAPTER 5. GROWTH, CHARACTERIZATION, AND PHYSICAL PROPERTIES OF NON-CRYSTALLINE AND NANOSTRUCTURED SILICON-BASED ALLOYS. CHAPTER 6. PHOTONIC AND MAGNETIC PROPERTIES OF SPARKP-ROCESSED SILICONCHAPTER 7. WET-CHEMICAL CONDITIONING OF SILICON: ELECTRONIC PROPERTIES CORRELATED WITH THE SURFACE MORPHOLOGY; Index.
Abstract: This book covers a broad spectrum of the silicon-based materials and their device applications. This book provides a broad coverage of the silicon-based materials including different kinds of silicon-related materials, their processing, spectroscopic characterization, physical properties, and device applications. This two-volume set offers a selection of timely topics on silicon materials namely those that have been extensively used for applications in electronic and photonic technologies. The extensive reference provides broad coverage of silicon-based materials, including different types of s