𝔖 Bobbio Scriptorium

✦ LIBER ✦

Silicon and silicon dioxide thermal bonding for silicon-on-insulator applications: R D Black et al, J appl Phys, 63, 1988, 2773–2777

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 156 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90944-5

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Scanning electron microscopy study of se

Scanning electron microscopy study of seeded recrystallization of silicon-on-insulator layers with either polycrystalline or epitaxially deposited silicon in the seed windows: D A Smith et al, J appl Phys, 63, 1988, 1438–1441

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 149 KB

5167. Effect of silicon dioxide surface-

5167. Effect of silicon dioxide surface-layer thickness on boron profiles for directly aligned implants into (100) silicon: D R Myers et al, J Appl Phys, 52 (5), 1981, 3357–3359

📂 Article 📅 1982 🏛 Elsevier Science 🌐 English ⚖ 144 KB