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Silane plasma and surface processes in amorphous silicon deposition

✍ Scribed by Nobuhiro Hata; Kazunobu Tanaka

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Fundamental mechanisms in silane plasma

✍ J.P.M. Schmitt 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 408 KB

The presence of silane gas in plasma-dep

✍ T. Bekkay; R. Izquierdo; M. St-Denis; E. Sacher; A. Yelon 📂 Article 📅 1989 🏛 Elsevier Science ⚖ 289 KB

The presence of silane gas in plasma-dep

✍ T. Bekkay; R. Izquierdo; M. St-Denis; E. Sacher; A. Yelon 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 443 KB

Deposition of amorphous silicon films fr

✍ J Andreu; G Sardin; JC Delgado; A Canillas; J Esteve; JL Morenza 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 168 KB

The mechanism of plasma-induced depositi

✍ S. Vepřek; M. Heintze 📂 Article 📅 1990 🏛 Springer 🌐 English ⚖ 968 KB

Analysis of amorphous-silicon deposition

✍ S. V. Petrov; E. P. Prokopiev; E. M. Sokolov 📂 Article 📅 1997 🏛 Italian Physical Society 🌐 English ⚖ 484 KB