Silane oxidation in a low pressure chemical vapor deposition system in the temperature range 100–450 °C

✍ Scribed by Cornel Cobianu

• Book ID: 103428005
• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 139 KB
• Volume: 226
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(93)90195-u