Organometallic Chemical Vapor Deposition of Palladium under Very Mild Conditions of Temperature in the Presence of a Low Reactive Gas Partial Pressure

✍ Scribed by Hierso, Jean-Cyrille; Satto, Christine; Feurer, Roselyne; Kalck, Philippe

• Book ID: 120310298
• Publisher: American Chemical Society
• Year: 1996
• Tongue: English
• Weight: 179 KB
• Volume: 8
• Category: Article
• ISSN: 0897-4756
• DOI: 10.1021/cm960106m