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SiCxNy:H films produced from an r.f. discharge of the SiH4CH4NH3 system

✍ Scribed by W. Zhang; J.-T. Wang

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 458 KB
Volume: 50
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(91)90186-z

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