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The effects of CO, H, NH3, CH3OH, H2O, and C2H4 on the electronic properties of ultrathin Cu films supported over Ru(0001): an XPS study

✍ Scribed by J.A Rodriguez; R.A. Campbell; J.S. Corneille; D.W. Goodman

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 648 KB
Volume: 180
Category: Article
ISSN: 0009-2614
DOI: 10.1016/0009-2614(91)87130-4

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✦ Synopsis

The interaction of CO, H, NHg, CH,OH, H20, and C*H,, with ultrathin Cu films supported on Ru (000 1) has been studied by means of XPS and TPD. For films with O,,< I, adsorption ofC0, &X4, and H induced shifts of +0.5, +0.3, and +0.25 eV, respectively, in the Cu(2p,,,) peak position. Negligible shifts were observed upon adsorption of NHJ, CHsOH, and HZO. The XPS results are consistent with a model in which the electron density transferred from a Cu monolayer to the adsorbates follows the trend: CO> C2H4, H > NH3, CH,OH, HZO.

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