SiC thin film thermistor
β Scribed by Takeshi Nagai; Kazushi Yamamoto; Ikuo Kobayashi
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 256 KB
- Volume
- 125
- Category
- Article
- ISSN
- 0040-6090
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π SIMILAR VOLUMES
Vanadium oxide thin film has been deposited on glass substrate at room temperature using pulsed laser deposition with the laser fluence of 1.4 J/cm 2 under high vacuum. X-ray photoelectron spectroscopy analysis shows that the film is oxygen deficient compared to the stoichiometric V 2 O 5 . X-ray di
## Abstract SiC film was deposited by electron beamβphysical vapor deposition on thermal oxidized silicon substrates at 750Β°C, and SiC/SiO~2~ composite thin film was prepared. The obtained composite film was analyzed by Fourierβtransform infrared (FTIR) transmission and reflection spectroscopy, and