Si and GaAs dry etching utilizing showered electron-beam assisted etching through Cl2 gas

✍ Scribed by Matsui, S.; Watanabe, H.

• Book ID: 121307704
• Publisher: American Institute of Physics
• Year: 1991
• Tongue: English
• Weight: 758 KB
• Volume: 59
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.106044