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Dry etching utilizing showered electron beam assisted etching

โœ Scribed by S. Matsui; H. Watanabe


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
375 KB
Volume
17
Category
Article
ISSN
0167-9317

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Damage as a result of ion bombardment may occur both at top surfaces and at sidewalls. We propose a method of probing sidewall damage using coherent electron focusing. A collimated electron beam is reflected off an internal boundary formed by dry etching. Spectra measured in an applied magnetic fiel