CCl4-assisted CF4 etching of silicon in a microwave-assisted LDE (laser dry etching)-process

✍ Scribed by W. Pfleging; D.A. Wesner; E.W. Kreutz

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 444 KB
• Volume: 96-98
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(95)00502-1