✦ LIBER ✦
Modelling of reactors for plasma processing I. Silicon etching by CF4 in a radial flow reactor
✍ Scribed by Manoj Dalvie; Klavs F. Jensen; David B. Graves
- Publisher
- Elsevier Science
- Year
- 1986
- Tongue
- English
- Weight
- 661 KB
- Volume
- 41
- Category
- Article
- ISSN
- 0009-2509
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