The dissociation of UFe sensitized by SFe excited with a pulsed CO\* laser in the presence of Iis and Co as scavc~ge~s has been investigated. in the SF~--UF~-HZ system the dissociation yieIds have been determined as a function of the laser frezyncy, the fluence. and Hs partial pressure. A masimum di
SF6 sensitized CO2 laser CVD of amorphous silicon
β Scribed by E. Golusda; P. Hessenthaler; G. Mollekopf; H. Stafast
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 352 KB
- Volume
- 69
- Category
- Article
- ISSN
- 0169-4332
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It has recently been suggested [ll that when l,l,l-trichloroethane is irradiated with a continuous-wave COP laser in the presence of SF6 sensitizer, the decomposition occurs in a molecular manner, viz. CH3CC13 4 CHZ = CCl2 + HC1 rather than by a radical-chain mechanism CHBCC13 CH3 -CC12 + C1 C1 + CH
UFs undergoes decomposition m the presence of SF6 when mixtures of both are madiated wrth a TEA CO2 laser. The mechanism for UFe decomposition may involve vrbrational energy transfer from excited SF, and laser absorption from the same laser pulse by excited UFe in its vibrational quasi-continuum \*