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SF6-sensitized dissociation of UF6 with a pulsed CO2 laser

โœ Scribed by Chin Chi-tsung; Hou Hui-qi; Bao Yi-han; Li Ting-hua

Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
395 KB
Volume
101
Category
Article
ISSN
0009-2614

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โœฆ Synopsis

The dissociation of UFe sensitized by SFe excited with a pulsed CO* laser in the presence of Iis and Co as scavc~ge~s has been investigated. in the SF~--UF~-HZ system the dissociation yieIds have been determined as a function of the laser frezyncy, the fluence. and Hs partial pressure. A masimum dissociation yield has been found at a laser frequency of 935 cm _ No obvious dissociation of UFs \as observed in the UF6-SF6 system without F-atom scavengers.

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