Semiconducting amorphous carbon films and carbon-single-crystal silicon heterojunctions
β Scribed by G.K. Bhagavat; K.D. Nayak
- Publisher
- Elsevier Science
- Year
- 1979
- Tongue
- English
- Weight
- 644 KB
- Volume
- 64
- Category
- Article
- ISSN
- 0040-6090
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A number of alkylsilanes and alkylcarbosilanes of widely different molecular structure are characterized in terms of their ability to form amorphous hydrogenated silicon-carbon (a-Si:C:H) films in atomic hydrogen-induced chemical vapor deposition (AHCVD). The compounds containing only Si-C and C-H b