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Self-lubricating SU-8 Nanocomposites for Microelectromechanical Systems Applications

✍ Scribed by Prabakaran Saravanan, Nalam Satyanarayana, Sujeet K. Sinha


Book ID
118811356
Publisher
Springer US
Year
2012
Tongue
English
Weight
620 KB
Volume
49
Category
Article
ISSN
1023-8883

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SU-8 nanocomposite photoresist with low
✍ SΓ©bastien Jiguet; Arnaud Bertsch; Moshe Judelewicz; Heinrich Hofmann; Philippe R πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 231 KB

A new nanocomposite photoresist based on SU-8 epoxy resin has been developed. It consists in a homogeneous dispersion of nanosilica particles in the negative tone photosensitive SU-8. The nanocomposite photoresist is more sensitive than the SU-8 photoresist and the photopatterned composite structure