๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Self-aligned fabrication of single crystal diamond gated field emitter array

โœ Scribed by Yamada, Takatoshi; Vinod, Purayath Robert; Hwang, Doo-Sup; Yoshikawa, Hiromichi; Shikata, Shin-ichi; Fujimori, Naoji

Book ID
122591872
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
304 KB
Volume
14
Category
Article
ISSN
0925-9635

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Beam-assisted-etching technique for fabr
Beam-assisted-etching technique for fabrication of single crystal diamond field emitter tip
โœ J. Taniguchi; J. Yokoyama; M. Komuro; H. Hiroshima; I. Miyamoto ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 773 KB

We fabricated a single crystal diamond field emitter tip using focused ion beam assisted etching and investigated characteristics of electron emission from single crystal diamond. Electron emission from single crystal diamond is field emission. FIB assisted etching is very useful to reduce emission

Fabrication of self-aligned gated silico
Fabrication of self-aligned gated silicon microtip array using electrochemical silicon etching
โœ Barillaro, G. ;D'Angelo, F. ;Pennelli, G. ;Pieri, F. ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 163 KB

## Abstract In this paper we report a new approach to fabricate gated silicon microtip arrays for field emission applications using a single mask process. The key role in the fabrication process is played by the photoelectrochemical etching of silicon in HFโ€based electrolytes. This technique is her