Selective deposition of gold nanoclusters on silicon by a galvanic displacement process
β Scribed by L. Magagnin; V. Bertani; P.L. Cavallotti; R. Maboudian; C. Carraro
- Book ID
- 104305765
- Publisher
- Elsevier Science
- Year
- 2002
- Tongue
- English
- Weight
- 556 KB
- Volume
- 64
- Category
- Article
- ISSN
- 0167-9317
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β¦ Synopsis
Gold nanoclusters are deposited selectively on silicon substrates by galvanic displacement from reversed micelle microemulsions. The water-in-oil system investigated comprises an organic phase (n-heptane), a surfactant (AOT), and an aqueous solution of hydrofluoric acid and metallic ions. X-ray diffraction and scanning electron microscopy are employed to investigate the correlation between the nominal size of the reversed micelles and the size of the metal clusters formed on the silicon substrate. The measured gold cluster radius is in good quantitative agreement with nominal micelle radius over a wide range of cluster size and deposition time.
π SIMILAR VOLUMES
Fine copper lines, with a width of less than 1 mm, were fabricated on silicon substrates. For the fabrication, oxidized (100) silicon substrates were used, covered with a film grown by LPCVD at 0.1 Torr and 5508C from W(CO) decomposition. 6 These substrates were subsequently covered with AZ 5214E ph