## Abstract A novel type of slit probe incorporating a micromachined silicon (Si) chip for millimeterβwave scanning nearβfield microscopy is proposed.To improve the spatial resolution and image contrast attainable in millimeterβwave microscopy, a metalβcoated Si chip with a microslit aperture fabri
Scanning near-field millimeter-wave microscopy using a metal slit as a scanning probe
β Scribed by Nozokido, T.; Bae, J.; Mizuno, K.
- Book ID
- 114554062
- Publisher
- IEEE
- Year
- 2001
- Tongue
- English
- Weight
- 322 KB
- Volume
- 49
- Category
- Article
- ISSN
- 0018-9480
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β¦ Synopsis
Jongsuck Bae (A'94-M'94-SM'98) was born in Nagoya, Japan, in 1953. He received the B.Eng. degree in electric engineering from the Korean University, Tokyo, Japan, in 1976, and the D.Eng. degree in electronic engineering from Tohoku University, Sendai, Japan, in 1990.In 1977, he joined the Research Institute of Electrical Communication, Tohoku University, where he has been an Associate Professor since 1992. His research has been in developing quasi-optical components, such as oscillators, modulators, and couplers used for millimeter and submillimeter wavelengths, and their applications.Dr. Bae is a member of the Institute of Electronics, Information and Communication Engineers (IEICE), Japan, and the Japan Society of Applied Physics.
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