Scanning electron microscopy of surfaces inducing shear hemolysis
β Scribed by Lampert, Richard H. ;Williams, Michael C.
- Publisher
- John Wiley and Sons
- Year
- 1973
- Tongue
- English
- Weight
- 614 KB
- Volume
- 7
- Category
- Article
- ISSN
- 0021-9304
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
A scanning electron microscope of ultra-high-vacuum (UHV-SEM) with a field emission gun (FEG) is operated at the primary electron energies of from 100 eV to 3 keV. The instrument can form the images that contain information on surface chemical composition, chemical bonding state (electronic structur
The diagnostic potential of reΓected electron energy-loss microscopy (REELM) and scanning Auger microscopy (SAM) are explored with respect to two particular aspects encountered in the surface microchemical analysis of semiconductor materials : determining the kind of coverage, i.e. whether continuou