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Run-to-run control charts with contrasts

โœ Scribed by George C. Runger; John W. Fowler


Publisher
John Wiley and Sons
Year
1998
Tongue
English
Weight
258 KB
Volume
14
Category
Article
ISSN
0748-8017

No coin nor oath required. For personal study only.

โœฆ Synopsis


In semiconductor manufacturing it is useful to design control charts to be sensitive to anticipated assignable causes. Process knowledge can be used to develop summaries for run-to-run control that are more sensitive to problems than traditional approaches. As the number of measurements recorded from a run increases, appropriate summaries derived from process knowledge become more important. Control charts based on linear contrasts are generated from partitions of a standard analysis of variance model. These contrasts simplify the development and interpretation of charts sensitized for specific assignable causes. The use of EWMA control charts for these statistics is described.


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