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Routine depth profiling of ultra shallow junctions by secondary ion mass spectrometry

โœ Scribed by Paul K. Chua; Victor K.F. Chia; Stephen P. Smith; Charles W. Magee


Book ID
114194579
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
563 KB
Volume
52
Category
Article
ISSN
0254-0584

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Depth profile measurement by secondary i
โœ M. Moens; M. van Craen; F.C. Adams ๐Ÿ“‚ Article ๐Ÿ“… 1984 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 1022 KB

The possibilities of measuring depth profiles by secondary ion mass spectrometry are evaluated. The influence of different instrumental and experimental parameters on depth resolution in the profiles are studied: the effects of primary ion beam characteristics, reactive gas adsorption and mechanical