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Role of kinetic energy of sputtered particles in thin film formation

✍ Scribed by Yasunori Taga; Riichi Takahasi


Book ID
117217598
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
707 KB
Volume
386
Category
Article
ISSN
0039-6028

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TiAl3 formation kinetic in sputtered Ti/
✍ C Bresolin; S Pirotta πŸ“‚ Article πŸ“… 2002 πŸ› Elsevier Science 🌐 English βš– 275 KB

Sputtered aluminum on titanium double layers are widely used in conventional interconnection schemes of integrated circuits (IC); one known phenomenon is the formation of intermetallic compounds. In this work, the kinetic of the TiAl reaction is studied by collecting the sheet resistance increase of