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Retardation and suppression of nickel silicide formation by N+ implantation

✍ Scribed by D.M. Scott; L. Wieluński; H. von Seefeld; M.-A. Nicolet

Publisher
Elsevier Science
Year
1981
Weight
472 KB
Volume
182-183
Category
Article
ISSN
0029-554X

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## Abstract Nickel‐titanium (NiTi) shape memory alloys are increasingly being used in orthopedic applications. However, there is a concern that Ni is harmful to the human body. We have recently investigated the use of nitrogen, or oxygen plasma immersion ion implantation to mitigate this deleteriou