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Ion implantation technique for simulatneous formation of a shallow silicon p-n junction and a shallow silicide-silicon ohmic contact

✍ Scribed by B.-Y. Tsaur; C.H. Anderson Jr.

Publisher: Elsevier Science
Year: 1983
Tongue: English
Weight: 604 KB
Volume: 104
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(83)90580-1

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