Resistivity of Copper Films at Thicknesses Near the Mean Free Path of Electrons in Copper Minimization of the Diffuse Scattering in Copper
β Scribed by Mallikarjunan, A.
- Book ID
- 121465349
- Publisher
- The Electrochemical Society
- Year
- 1999
- Tongue
- English
- Weight
- 39 KB
- Volume
- 3
- Category
- Article
- ISSN
- 1099-0062
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π SIMILAR VOLUMES
Theoretical values of the inelastic mean free path (IMFP) and their electron-energy dependence are available in the literature from predictive formulae for various categories of materials, such as elemental solids, inorganic and organic compounds. in contrast, the experimental IMFP values were deter
From our measurements of the electrical resistivity of gradually strained Cu-whiskers between T=0.4 and 2 K the variation of the Tacoefficient A of the electron-electron scattering term with dislocation density is determined. Furthermore, we calculate the enhancement of A by dislocation-induced anis