Resistive switching dependence on atomic layer deposition parameters in HfO2-based memory devices

✍ Scribed by Zazpe, Raúl ;Ungureanu, Mariana ;Golmar, Federico ;Stoliar, Pablo ;Llopis, Roger ;Casanova, Fèlix ;Pickup, David F. ;Rogero, Celia ;Hueso, Luis E.

• Book ID: 121370771
• Publisher: The Royal Society of Chemistry
• Year: 2014
• Tongue: English
• Weight: 900 KB
• Volume: 2
• Category: Article
• ISSN: 2050-7526
• DOI: 10.1039/C3TC31819B