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Residual stress in stabilized zirconia thin films prepared by r.f. magnetron sputtering

โœ Scribed by P. Scardi; P. Polonioli; S. Ferrari

Book ID
107864503
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
535 KB
Volume
253
Category
Article
ISSN
0040-6090

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Electrical and structural properties of
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โœ K.P.S.S. Hembram; Gargi Dutta; Umesh V. Waghmare; G. Mohan Rao ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 819 KB

Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp