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Reproducibility and stability of N–Al codopedp-type ZnO thin films

✍ Scribed by J. G. Lu; L. P. Zhu; Z. Z. Ye; F. Zhuge; B. H. Zhao; D. W. Ma; L. Wang; J. Y. Huang


Publisher
Springer
Year
2006
Tongue
English
Weight
537 KB
Volume
41
Category
Article
ISSN
0022-2461

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Al and N codoped ZnO thin films were grown on n-Si (100) substrate by sputtering technique. Hall effect measurements of as-grown films exhibited n-type conduction, however 500 °C Ar annealed codoped films showed p-type conductivity with a hole concentration of 9.9 × 10 16 cm -3 , resistivity of 15.9