Removal efficiency of organic contaminants on Si wafer surfaces by the N2O ECR plasma technique

✍ Scribed by Dae Kyu Kim; Yun Kyu Park; Subhayan Biswas; Chongmu Lee

• Book ID: 113781194
• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 217 KB
• Volume: 91
• Category: Article
• ISSN: 0254-0584
• DOI: 10.1016/j.matchemphys.2004.12.015