Removal efficiency of organic contaminants on Si wafer by dry cleaning using UV/O3 and ECR plasma

✍ Scribed by K. Choi; S. Ghosh; J. Lim; C.M. Lee

• Book ID: 108417920
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 343 KB
• Volume: 206
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/s0169-4332(02)01215-1